Title:
小角Ｘ線スキャタロメトリ用Ｘ線ズームレンズ
Document Type and Number:
Japanese Patent JP6906630
Kind Code:
B2
Abstract:
Methods and systems for controlling illumination beam spot size for Transmission, Small-Angle X-ray Scatterometry (T-SAXS) measurements of different sized metrology targets are described herein. An X-ray illumination optics subsystem includes one or more focusing optical elements with object and image planes at fixed locations and one or more illumination apertures or slits that independently control magnification and beam divergence. In a further aspect, the illumination source size and shape is controlled, along with magnification and beam divergence. In this manner, beam divergence and illumination spot size on a specimen are independently controlled, while maintaining constant illumination flux.
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Inventors:
Artemive Nikolai
Friedman Michael
Friedman Michael
Application Number:
JP2019556558A
Publication Date:
July 21, 2021
Filing Date:
January 02, 2018
Export Citation:
Assignee:
KLA Corporation
International Classes:
G01N23/201; G01N23/20008; H01J35/00; H01L21/66
Domestic Patent References:
| JP2008014861A | ||||
| JP2006029971A | ||||
| JP2006519393A |
Foreign References:
| US20060108534 | ||||
| US7809108 | ||||
| WO2016103834A1 |
Attorney, Agent or Firm:
Patent Corporation yki International Patent Office