Title:
An application device and a coating method
Document Type and Number:
Japanese Patent JP6125783
Kind Code:
B2
Abstract:
The present invention forms a coating film on a substrate with good precision and at high speed even when coating a coating solution of relatively high viscosity on the substrate. Specifically, the coating device (1) is provided with a tank (9) for storing the coating solution and a nozzle (3) in which a slit (21) for discharging the coating solution supplied from the tank (9) is formed. The coating solution is coated on the substrate by discharging the coating solution from the slit (21). The coating device (1) is provided with a temperature-raising unit (30) for raising the temperature of the coating solution supplied from the tank (9) and a temperature-homogenizing unit (40) for homogenizing the temperature of the coating solution, the temperature of which has been raised by the temperature-raising unit, prior to discharging the coating solution from the slit (21).
Inventors:
Kenji Hayashida
Yoshiyuki Kitamura
Hiroshi Kawatake
Yasuhiko Oshimo
Koichi Murao
Yoshiyuki Kitamura
Hiroshi Kawatake
Yasuhiko Oshimo
Koichi Murao
Application Number:
JP2012209288A
Publication Date:
May 10, 2017
Filing Date:
September 24, 2012
Export Citation:
Assignee:
Toray Engineering Co., Ltd.
International Classes:
B05C5/02; B05C11/10; B05D1/26; B05D3/00
Domestic Patent References:
| JP2003170098A | ||||
| JP2009082791A | ||||
| JP2005028212A | ||||
| JP2007190456A | ||||
| JP2000288453A | ||||
| JP2003154302A | ||||
| JP2003159557A | ||||
| JP20019342A | ||||
| JP200129861A | ||||
| JP2006175415A |
Attorney, Agent or Firm:
Patent Business Corporation Suncrest International Patent Office
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