Title:
A base plate supporter and a pattern formation device
Document Type and Number:
Japanese Patent JP6229785
Kind Code:
B2
Abstract:
Provided are: a substrate base provided with a surface for supporting, in a flat state or a curved state having a prescribed curve, a flexible and transmissive substrate to be optically treated; and a film formed on the surface of the substrate base and having a reflectance of 50% or less in relation to the light (ultraviolet rays for exposure, visible light for alignment, etc.) used in the optical treatment.
Inventors:
Masaki Kato
Yoshiaki Kitou
Masakazu Hori
Toru Kiuchi
Yoshiaki Kitou
Masakazu Hori
Toru Kiuchi
Application Number:
JP2016234202A
Publication Date:
November 15, 2017
Filing Date:
December 01, 2016
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
G03F9/00; B65H27/00; G03F7/24; H01L21/68
Domestic Patent References:
| JP2009231169A | ||||
| JP2000187428A | ||||
| JP2012203286A | ||||
| JP2007114357A | ||||
| JP2007102200A | ||||
| JP2005129935A | ||||
| JP8139168A | ||||
| JP60134422A | ||||
| JP2003094724A | ||||
| JP2000012452A |
Attorney, Agent or Firm:
Masatake Shiga
Tadashi Takahashi
Tadashi Takahashi