Title:
チャンバ装置および極端紫外光生成装置
Document Type and Number:
Japanese Patent JP5876711
Kind Code:
B2
Abstract:
A chamber apparatus, which may be used with an external apparatus having an obscuration region, may include: a chamber in which EUV light is generated; a collector mirror having a first through-hole formed in a region aside from the center thereof and configured to collect the EUV light generated inside the chamber, the collector mirror being positioned such that the first through-hole is located in a region substantially corresponding to the obscuration region; and an etching gas supply unit provided in the first through-hole and configured to supply an etching gas into the chamber.
Inventors:
Shinji Nagai
Junichi Fujimoto
Koshi Ashikawa
Junichi Fujimoto
Koshi Ashikawa
Application Number:
JP2011251786A
Publication Date:
March 02, 2016
Filing Date:
November 17, 2011
Export Citation:
Assignee:
Gigaphoton Co., Ltd.
International Classes:
H05G2/00
Domestic Patent References:
| JP2010123928A | ||||
| JP2010199560A | ||||
| JP2010538420A |
Foreign References:
| US20110226745 |
Attorney, Agent or Firm:
Hosaka Enju
Nobuaki Arai
Hiroaki Sakai
Nobuaki Arai
Hiroaki Sakai