Title:
A cleaning method of the surface of an ion bombardment device and the substrate using this device
Document Type and Number:
Japanese Patent JP6076112
Kind Code:
B2
Abstract:
Provided is an ion bombardment device (1) for stabilizing and cleaning the surface of a substrate. The device is provided with the following: a vacuum chamber (2); at least one electrode (3) that is disposed on the inner wall face of the vacuum chamber (2) and emits electrons; a plurality of anodes (4) that receive the electrons from the electrode (3) and that are arranged so as to face the electrode with the substrate sandwiched therebetween; and a plurality of discharge power sources (5) corresponding to the anodes (4) respectively. Each of the discharge power sources (5) is insulated from the vacuum chamber (2) and provides to the anode (4) corresponding to the relevant discharge power source (5) currents and voltages that can be set independently of one another, thereby generating a glow discharge between such anode (4) and the electrode (3).
Inventors:
Satoshi Hirota
Nomura Honor
Liner cremer
Nomura Honor
Liner cremer
Application Number:
JP2013022264A
Publication Date:
February 08, 2017
Filing Date:
February 07, 2013
Export Citation:
Assignee:
KABUSHIKI KAISHA KOBE SEIKO SHO
International Classes:
C23C14/02
Domestic Patent References:
| JP2011252193A | ||||
| JP2007138286A | ||||
| JP2004156091A | ||||
| JP2004323883A | ||||
| JP2006009068A | ||||
| JP2009001898A | ||||
| JP4208258B2 |
Attorney, Agent or Firm:
Toshio Yasuda
Mikio Yasuda
Mikio Yasuda
Previous Patent: A massive cell valuation method and a massive cell evaluation system
Next Patent: INVERTER TRANSFORMER
Next Patent: INVERTER TRANSFORMER