Title:
エポキシ基及びカルコン基を有する化合物、その製造方法、及びこれを含むフォトレジスト組成物
Document Type and Number:
Japanese Patent JP4723845
Kind Code:
B2
Abstract:
A compound including an epoxy group that has a heat curing property and a chalcone group that has a radiation curing property is represented by the following formula: wherein n is an integer from 1 to 10,000, and each of R1, R2, R3, R4, R5, R6, R7 and R8 is selected from a group consisting of a hydrogen atom, alkyl group, alkoxy group, halogen atom and nitro group. The compound has a high curing efficiency. A photoresist composition including the compound above substantially prevents the formation of remnant in a photoresist pattern used in the manufacturing of a color filter. In addition, the color filter pattern that is formed using the photoresist composition has high color reproductivity and brightness.
Inventors:
Be east hoho
Gold box
Ginger
Gold box
Ginger
Application Number:
JP2004311754A
Publication Date:
July 13, 2011
Filing Date:
October 27, 2004
Export Citation:
Assignee:
Samsung Electronics Co.,Ltd.
International Classes:
C08G59/04; G03F7/004; C07D303/18; C07D303/24; C07D407/14; C08G59/24; C08G65/00; C08L63/00; G02B5/20; G03C1/76; G03F7/00; G03F7/027; G03F7/038; H01L51/50; H05B33/14
Domestic Patent References:
| JP9100339A |
Other References:
Choi, D. H.; Oh, S. J.; Cha, H. B.; Lee, J. Y.,Photochemically bifunctional epoxy compound containing a chalcone moiety,European Polymer Journal ,2001年,37(10),p.1951-1959
Choi, Dong Hoon; Cha, Young Kwan,Optical anisotropy of chalcone-based epoxy compound under irradiation of linearly polarized UV light,Polymer,2002年,43(3),p.703-710
Choi, Dong Hoon; Cha, Young Kwan,Optical anisotropy of chalcone-based epoxy compound under irradiation of linearly polarized UV light,Polymer,2002年,43(3),p.703-710
Attorney, Agent or Firm:
Yukio Ono
Tomoko Inazumi
Tomoko Inazumi