Title:
化合物、これを含むフォトレジスト組成物、これを含むフォトレジストパターン及びフォトレジストパターンの製造方法
Document Type and Number:
Japanese Patent JP7067831
Kind Code:
B2
Abstract:
The present specification provides a compound, a photoresist composition comprising the same, a photoresist pattern comprising the same, and a method for preparing a photoresist pattern.
Inventors:
Park, Hyunmin
Rim, Mignon
Rim, Mignon
Application Number:
JP2020539834A
Publication Date:
May 16, 2022
Filing Date:
October 11, 2019
Export Citation:
Assignee:
LG HAUSYS,LTD.
International Classes:
C07C381/12; C07C309/12; C07C321/30; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP2008106045A | ||||
| JP2013092618A | ||||
| JP2012003249A | ||||
| JP2013520458A |
Attorney, Agent or Firm:
Longhua International Patent Service Corporation