Title:
CRYSTAL GROWTH APPARATUS FOR EFG METHOD
Document Type and Number:
Japanese Patent JP2017193472
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a crystal growth apparatus for EFG method facilitating short-time installation of heat reflection plates at optimum intervals capable of uniformizing heat distribution in an upper portion of a crucible according to a width dimension of a die.SOLUTION: A crystal growth apparatus for EFG method includes at least a die having a slit, a crucible, a lid, and a plurality of heat reflection plates. The die is housed in the crucible, and an opening of the crucible except the die is covered with the lid. The plurality of heat reflection plates are provided successively from the side on which the crucible is installed. The crystal growth apparatus is formed so that each interval to a lower surface of a second and subsequent heat reflection plates with respect to an upper surface of the lid as a reference plane is not a natural number multiple (excluding multiples of zero and one) of an interval to a lower surface of the first heat reflection plate with respect to the upper surface of the lid as the reference plane.SELECTED DRAWING: Figure 5
Inventors:
HIGUCHI KAZUTO
KAMATA KAZUHIKO
SASAKI TADASHI
SASAKI NOBUYOSHI
YAGUCHI YOICHI
KAMATA KAZUHIKO
SASAKI TADASHI
SASAKI NOBUYOSHI
YAGUCHI YOICHI
Application Number:
JP2016086323A
Publication Date:
October 26, 2017
Filing Date:
April 22, 2016
Export Citation:
Assignee:
NAMIKI PRECISION JEWEL CO LTD
International Classes:
C30B29/20; C30B15/34