Title:
抑制電極の熱変形を制御するための装置及びイオンビームの均一性を制御するための装置
Document Type and Number:
Japanese Patent JP7093358
Kind Code:
B2
Abstract:
An apparatus for improving the uniformity of an ion beam is disclosed. The apparatus includes a heating element to heat an edge of the suppression electrode that is located furthest from the suppression aperture. In operation, the edge of the suppression electrode nearest to the suppression electrode may be heated by the ion beam. This heat may cause the suppression electrode to distort, affecting the uniformity of the ion beam. By heating the distal edge of the suppression electrode, the thermal distortion of the suppression electrode can be controlled. In other embodiments, the distal edge of the suppression electrode is heated to create a more uniform ion beam. By monitoring the uniformity of the ion beam downstream from the suppression electrode, such as by use of a beam uniformity profiler, a controller can adjust the heat applied to the distal edge to achieve the desired ion beam uniformity.
Inventors:
James Peabu Onodono
Application Number:
JP2019539933A
Publication Date:
June 29, 2022
Filing Date:
November 16, 2017
Export Citation:
Assignee:
Varian Semiconductor Equipment Associates Incorporated
International Classes:
H01J37/04; H01J27/02; H01J37/08
Domestic Patent References:
| JP2016225508A | ||||
| JP2009540534A | ||||
| JP2008034230A |
Foreign References:
| US20140265855 |
Attorney, Agent or Firm:
Kenji Sugimura
Masaaki Ishikawa
Masaaki Ishikawa
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