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Title:
A device and a method for UV processing, a chemical treatment, and deposition
Document Type and Number:
Japanese Patent JP5976776
Kind Code:
B2
Abstract:
Embodiments of the present invention provide apparatus and methods for performing UV treatment and chemical treatment and/or deposition in the same chamber. One embodiment of the present invention provides a processing chamber including a UV transparent gas distribution showerhead disposed above a substrate support located in an inner volume of the processing chamber, a UV transparent window disposed above the UV transparent gas distribution showerhead, and a UV unit disposed outside the inner volume. The UV unit is configured to direct UV lights towards the substrate support through the UV transparent window and the UV transparent gas distribution showerhead.

Inventors:
Bangsal, Amit
DuBois, Dale Earl.
Rocha-Alvarez, Juan Carlos
Barja, Sanjeev
Hendrickson, Scott A.
Novak, thomas
Application Number:
JP2014503984A
Publication Date:
August 24, 2016
Filing Date:
April 05, 2012
Export Citation:
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Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
H01L21/31; H01L21/316; H01L21/768; H01L23/532
Domestic Patent References:
JP6093454A
JP2008075179A
JP4505347A
JP10154705A
JP2010103151A
JP10079380A
JP10121252A
JP2001332465A
JP2003045862A
JP10199874A
JP2007318141A
JP2005209771A
JP2009272595A
Foreign References:
US20110076401
WO2009137272A2
Attorney, Agent or Firm:
Sonoda Yoshitaka
Kobayashi Yoshinori



 
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