Title:
極紫外光を発生させる装置
Document Type and Number:
Japanese Patent JP7022773
Kind Code:
B2
Abstract:
An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element.
Inventors:
Bikanov Alexander
Hoddykin Olek
Wack Daniel Sea
Zigzkin Constantine
Hale Layton
Walsh Joseph
Chirese Frank
Garcia Rudiev
Earl Brian
Hoddykin Olek
Wack Daniel Sea
Zigzkin Constantine
Hale Layton
Walsh Joseph
Chirese Frank
Garcia Rudiev
Earl Brian
Application Number:
JP2020013989A
Publication Date:
February 18, 2022
Filing Date:
January 30, 2020
Export Citation:
Assignee:
KLA Corporation
International Classes:
G03F7/20; G01N21/84; G01N21/956; G03F1/84; H05G2/00; H05H1/24
Domestic Patent References:
| JP2012054551A | ||||
| JP2001015296A | ||||
| JP2008294393A | ||||
| JP2012169241A | ||||
| JP2003257698A | ||||
| JP64006349A | ||||
| JP2007109451A | ||||
| JP2001057298A | ||||
| JP2009260019A | ||||
| JP2001357998A |
Foreign References:
| US20130063803 | ||||
| US6320937 |
Attorney, Agent or Firm:
Patent Corporation yki International Patent Office
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