A disposal method of containing halogen polymethacrylic acid ester

Title:

A disposal method of containing halogen polymethacrylic acid ester

Document Type and Number:

Japanese Patent JP6019844

Kind Code:

B2

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Inventors:

Keiichi Sakashita
Taeko Onuma
Tetsuya Noda

Application Number:

JP2012155532A

Publication Date:

November 02, 2016

Filing Date:

July 11, 2012

Export Citation:

Assignee:

Mitsubishi Rayon Co., Ltd.

International Classes:

C08F8/16; C08F20/12

Domestic Patent References:

Attorney, Agent or Firm:

Atsushi Aoki
Takashi Ishida
Tetsuji Koga
Yoshihiro Kobayashi
Satoshi Deno
Naoki Kobayashi

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