Title:
An electron beam generator, electron beam irradiation equipment, electronic beam exposure equipment, and a manufacturing method
Document Type and Number:
Japanese Patent JP5994271
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an electron beam generator which improves the parallel degree improving throughput of an electron beam exposure device.SOLUTION: An electron beam generator includes: a substrate provided with multiple holes; multiple electron emission parts respectively provided on bottom surfaces of the multiple holes and emitting electrons; and multiple first electrode parts which are provided corresponding to the multiple electron emission parts respectively, accelerate the electrons emitted from the corresponding electron emission parts, and output the electrons from the holes provided with the electron emission parts as electron beams. The electron beam generator, an electron beam radiation device, an electron beam exposure device, and a manufacturing method are provided.
Inventors:
Masayoshi Esashi
Naokatsu Ikegami
Akira Kojima
Naokatsu Ikegami
Akira Kojima
Application Number:
JP2012027488A
Publication Date:
September 21, 2016
Filing Date:
February 10, 2012
Export Citation:
Assignee:
Tohoku University
National University Corporation Tokyo University of Agriculture and Technology
Crestec Co., Ltd.
National University Corporation Tokyo University of Agriculture and Technology
Crestec Co., Ltd.
International Classes:
H01J37/06; H01J1/312; H01J9/02; H01J37/063; H01J37/073; H01J37/305
Domestic Patent References:
JP4206123A | ||||
JP8264108A | ||||
JP7192682A | ||||
JP11067058A | ||||
JP57187849A | ||||
JP3055738A | ||||
JP63006718A | ||||
JP63150836A | ||||
JP2011181416A | ||||
JP2011151044A | ||||
JP2004055556A |
Attorney, Agent or Firm:
Longhua International Patent Service Corporation