Title:
An etching method using approaching space light
Document Type and Number:
Japanese Patent JP6274717
Kind Code:
B2
Inventors:
Motoichi Otsu
Takashi Yai
Nomura Wataru
Takashi Yai
Nomura Wataru
Application Number:
JP2012156812A
Publication Date:
February 07, 2018
Filing Date:
July 12, 2012
Export Citation:
Assignee:
Nano Photonics Engineering Promotion Organization
International Classes:
H01L21/302; H01L21/027
Domestic Patent References:
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Attorney, Agent or Firm:
Yasuhiko
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