Title:
Exposure equipment and device manufacturing method
Document Type and Number:
Japanese Patent JP6341090
Kind Code:
B2
Abstract:
An exposure apparatus includes a liquid immersion member including a first member and a second member and configured to form a liquid immersion space of the liquid, a driving apparatus configured to move the second member with respect to the first member; and a controller configured to control the driving apparatus. The controller controls the driving apparatus so that a first operation of the second member in a first movement period of the substrate between exposure termination of a first shot region and exposure start of a second shot region is different from a second operation of the second member in a second movement period of the substrate between exposure termination of a third shot region and exposure start of a fourth shot region, the first and second shot regions being included in the same row, the third and fourth shot regions being arranged in different rows.
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Inventors:
Mako Sato
Application Number:
JP2014540846A
Publication Date:
June 13, 2018
Filing Date:
October 08, 2013
Export Citation:
Assignee:
NIKON CORPORATION
International Classes:
G03F7/20
Domestic Patent References:
| JP2007142428A | ||||
| JP2011029658A | ||||
| JP2011258602A | ||||
| JP2011258999A |
Attorney, Agent or Firm:
Masatake Shiga
Tadashi Takahashi
Tadashi Takahashi