An exposure device, an exposure method, and a device manufacturing method

Japanese Patent JP6052439

B2

When a transition from a first state where one stage (WST1 (or WST2)) is positioned at a first area directly below projection optical system (PL) to which liquid (Lq) is supplied to a state where the other stage (WST2 (or WST1)) is positioned at the first area, both stages are simultaneously driven while a state where both stages are close together in the X-axis direction is maintained. Therefore, it becomes possible to make a transition from the first state to the second state in a state where liquid is supplied in the space between the projection optical system and the specific stage directly under the projection optical system. Accordingly, the time from the completion of exposure operation on one stage side until the exposure operation begins on the other stage side can be reduced, which allows processing with high throughput. Further, because the liquid can constantly exist on the image plane side of the projection optical system, generation of water marks on optical members of the projection optical system on the image plane side is prevented.

JP4358189	Substrate processing method
WO/2003/087710	METHOD AND APPARATUS FOR STAGE MIRROR MAPPING

Yuichi Shibasaki

JP2016006012A

December 27, 2016

January 15, 2016

Click for automatic bibliography generation  

NIKON CORPORATION

G03F7/20; H01L21/68

JP10163098A
JP2001223159A
JP2000164504A
JP2001118773A
JP2003017404A
JP2000505958A
JP8051069A
JP10163099A
JP2003249443A
JP2006319367A
JP2005005707A
JP2005026649A
JP2006523377A
JP2004289128A
JP2004165666A

WO1999049504A1
WO1998040791A1
WO2003065427A1
WO2004090577A2

Seiji Ohno
Kobayashi Hideyoshi
Hiroshi Otani

Previous Patent: Communication apparatus

Next Patent: REST-AMOUNT DETECTING APPARATUS FOR FORM-SHEETS IN COPYING MACHINE