Title:
露光装置
Document Type and Number:
Japanese Patent JP7427352
Kind Code:
B2
Abstract:
To provide an exposure device capable of enhancing uniformity on an irradiation surface of exposed illumination light even when in the vicinity of the center of an irradiation area is the light strong and surrounding thereof weak by aligning many LDs and using an exposure light source irradiating uniformly an article to be illuminated with a light ejected from each light source.SOLUTION: In an exposure device having an exposure light source ejecting an illumination light for exposure on a substrate and containing a plurality of semiconductor lasers, a two-dimensional space modulator to which the illumination light is injected, and a stage for scanning exposure by moving the substrate to the illumination light, an optical filter arranged on a light axis of the illumination light between the exposure light source and the two-dimensional space modulator is equipped, transmittance of the optical filter changes in a first direction but does not in a second direction at right angle to the first direction on a plane vertically crossing the light axis, transmittance at a center position in the first direction is the highest, and becomes lower toward periphery.SELECTED DRAWING: Figure 1
Inventors:
Katsuro Kobayashi
Application Number:
JP2017250763A
Publication Date:
February 05, 2024
Filing Date:
December 27, 2017
Export Citation:
Assignee:
Adtech Engineering Co., Ltd.
International Classes:
G03F7/20; G02B19/00
Domestic Patent References:
| JP2002100561A | ||||
| JP2004039871A | ||||
| JP2006186291A | ||||
| JP2006019702A | ||||
| JP2010157649A | ||||
| JP2006066429A | ||||
| JP5267124A | ||||
| JP2009086015A | ||||
| JP2005055881A |
Foreign References:
| US20070296936 |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
Toyotaka Abe
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
Toyotaka Abe