Title:
A focus extraction method of a picture, a defect inspection method, a defect inspection device
Document Type and Number:
Japanese Patent JP6281291
Kind Code:
B2
Inventors:
Hideaki Kobayashi
Application Number:
JP2014005670A
Publication Date:
February 21, 2018
Filing Date:
January 16, 2014
Export Citation:
Assignee:
Dai Nippon Printing Co.,Ltd.
International Classes:
G06T7/143; G01N21/88; G06T1/00
Domestic Patent References:
| JP1004877A |
Other References:
白土昌孝,外2名,“マスク検査装置の欠陥検出画像シミュレーション技術”,東芝レビュー,株式会社東芝,2008年 8月 1日,第63巻,第8号,p.15-19
Attorney, Agent or Firm:
Hiromi Fujimasu
Keiko Fukamachi
Hideo Ito
Naoki Goto
Yusuke Ito
Hideyuki Tateishi
Keiko Fukamachi
Hideo Ito
Naoki Goto
Yusuke Ito
Hideyuki Tateishi
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