Title:
レジストパターンの形成方法及び加熱処理装置
Document Type and Number:
Japanese Patent JP4328516
Kind Code:
B2
Abstract:
A forming method of a resist pattern includes the following two steps. The first step is to carry out a heat treatment of a substrate, on which a resist pattern is formed, in a first heat treatment temperature in a first treatment period. The second step is to change said first heat treatment temperature to a second heat treatment temperature during said heat treatment such that a variation of dimensions of said resist pattern in said heat treatment reaches a desirable variation in a second treatment period.
Inventors:
Hiroshi Yoshino
Application Number:
JP2002338482A
Publication Date:
September 09, 2009
Filing Date:
November 21, 2002
Export Citation:
Assignee:
Elpida Memory Co., Ltd.
International Classes:
G03F7/40; H01L21/027; A21B1/22; F27D11/00; H01L21/308
Domestic Patent References:
| JP2002231601A | ||||
| JP2002064047A | ||||
| JP2012909A | ||||
| JP2003234279A |
Attorney, Agent or Firm:
Minoru Kudo