Title:
A formation method of the lower film using the compound for lower film formation of a resist pattern, a constituent, and this
Document Type and Number:
Japanese Patent JP6247693
Kind Code:
B2
Inventors:
Han Soo Young
Lee Jong-yeol
Jeju
Kim Jae Hyun
Lee Jong-yeol
Jeju
Kim Jae Hyun
Application Number:
JP2015531853A
Publication Date:
December 13, 2017
Filing Date:
September 12, 2013
Export Citation:
Assignee:
DONGJIN SEMICHEM CO., LTD.
International Classes:
C07D251/34; B82Y40/00; C07D405/14; C07D409/14; G03F7/004; G03F7/11; G03F7/40; H01L21/027
Domestic Patent References:
| JP2010212656A |
Foreign References:
| US20120164338 |
Attorney, Agent or Firm:
Kenichi Morita
Kenjiro Yamaguchi
Hironori Nagayama
Yuzaki Ozaki
Kenjiro Yamaguchi
Hironori Nagayama
Yuzaki Ozaki