PHOTOSENSITIVE CONDUCTIVE FILM, METHOD FOR FORMING CONDUCTIVE PATTERN, AND METHOD FOR PRODUCING CONDUCTIVE PATTERN SUBSTRATE

Japanese Patent JP2017201349

A

PROBLEM TO BE SOLVED: To provide a photosensitive conductive film that enables the formation of a conductive pattern having a curable resin film resistant to water absorption; a method of forming a conductive pattern and a method for producing a conductive pattern substrate using the same; and a conductive pattern substrate and a touch panel sensor.SOLUTION: A photosensitive conductive film contains a support film, a conductive film provided on the support film, and a photosensitive resin layer provided on the conductive film. The photosensitive resin layer contains (A) a binder polymer, (B) a photopolymerizable compound having an ethylenically unsaturated bond, (C) a photopolymerization initiator, and (D) an organic peroxide.SELECTED DRAWING: None

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SESATO YASUHIRO
TERAWAKI TOMONORI
AJIOKA YOSHIKI
NAKAMURA KANAMI
YOSHIDA HIDEKI

JP2016092494A

November 09, 2017

May 02, 2016

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HITACHI CHEMICAL CO LTD

G03F7/004; G06F3/041; G06F3/044; H01B5/14; H01B13/00

Yoshiki Hasegawa
Yoshinori Shimizu
Hiroyuki Hirano

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