Title:
ガス制御システム、該ガス制御システムを備えた成膜装置、該ガス制御システムに用いるプログラム及びガス制御方法。
Document Type and Number:
Japanese Patent JP6914063
Kind Code:
B2
Abstract:
The present invention makes it easy to control the amount of material gas led out of a tank. Accordingly, carrier gas is introduced into a tank containing a material and together with the carrier gas, from the tank, material gas produced by vaporization of the material is led out. A control part controls the flow rate of the carrier gas so that a concentration index value obtained by measuring mixed gas led out of the tank and indicating the concentration of the material gas in the mixed gas comes close to a predetermined target concentration index value. In addition, the control part controls the flow rate of the carrier gas to change at a predetermined change rate, and then controls the flow rate of the carrier gas on the basis of the deviation between the concentration index value and the target concentration index value.
Inventors:
Sakaguchi Yuhei
Toru Shimizu
Masakazu Minami
Daisuke Hayashi
Toru Shimizu
Masakazu Minami
Daisuke Hayashi
Application Number:
JP2017046224A
Publication Date:
August 04, 2021
Filing Date:
March 10, 2017
Export Citation:
Assignee:
HORIBA STEC Co., Ltd.
International Classes:
C23C16/455; C23C16/448; G05D21/00; H01L21/31
Domestic Patent References:
| JP2004091917A | ||||
| JP2014196537A | ||||
| JP2014530673A |
Attorney, Agent or Firm:
Ryuhei Nishimura
Saito Shindai
Uemura Yoshinaga
Saito Shindai
Uemura Yoshinaga