Title:
The gas distribution showerhead which has the high radiation rate surface
Document Type and Number:
Japanese Patent JP5911491
Kind Code:
B2
Abstract:
Embodiments of the present invention provide methods and apparatus for surface coatings applied to process chamber components utilized in chemical vapor deposition processes. In one embodiment, the apparatus provides a showerhead apparatus comprising a body, a plurality of conduits extending through the body, each of the plurality of conduits having an opening extending to a processing surface of the body, and a coating disposed on the processing surface, the coating being about 50 microns to about 200 microns thick and comprising a coefficient of emissivity of about 0.8, an average surface roughness of about 180 micro-inches to about 220 micro-inches, and a porosity of about 15% or less.
Inventors:
Hiroshi Hanawa
Maun, cawin
Chun, Fur
Tsui, Jie
Boule, david
Sue, Way-Yang
Chen, Liang-Yu
Maun, cawin
Chun, Fur
Tsui, Jie
Boule, david
Sue, Way-Yang
Chen, Liang-Yu
Application Number:
JP2013525905A
Publication Date:
April 27, 2016
Filing Date:
June 09, 2011
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
H01L21/205; C23C16/455
Domestic Patent References:
| JP8144060A | ||||
| JP7176524A | ||||
| JP2007081218A | ||||
| JP2007201406A | ||||
| JP2004002101A | ||||
| JP2007180417A |
Foreign References:
| WO2010087385A1 |
Other References:
竹内外1名,酸化物表面の親水性・疎水性と表面濡れ性の評価,表面科学,日本,日本表面科学会,2009年,Vol. 30, No. 3,pp. 148-156
Attorney, Agent or Firm:
Sonoda Yoshitaka
Kobayashi Yoshinori
Kobayashi Yoshinori