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Title:
An illumination-light study system, an exposure device, a lighting method, an exposure method, and a device manufacturing method
Document Type and Number:
Japanese Patent JP5935920
Kind Code:
B2
Abstract:
An illumination optical system which illuminates an illumination objective surface with a light from a light source. The illumination optical system includes a spatial light modulator which includes a plurality of optical elements arranged within a predetermined plane and controlled individually, and which forms a light intensity distribution in an illumination pupil of the illumination optical system; and a polarization unit which is arranged in a position optically conjugate with the predetermined plane, and which polarizes an incident light beam having a first and second partial light beams, coming into the polarization unit such that the first and second partial light beams have polarization states different from each other, and emits the polarized incident light beam as an outgoing light beam, wherein the polarization unit changes, in a cross section of the outgoing light beam, a ratio between a cross sectional areas of the first and second partial light beams.

Inventors:
Osamu Yatsu
Hirohisa Tanaka
Kinya Kato
Takashi Mori
Application Number:
JP2015076962A
Publication Date:
June 15, 2016
Filing Date:
April 03, 2015
Export Citation:
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Assignee:
NIKON CORPORATION
International Classes:
G02B19/00; G03F7/20
Domestic Patent References:
JP2009111223A
JP2010087389A
JP2006208432A
Attorney, Agent or Firm:
Takao Yamaguchi