Title:
The illumination-light study unit for a projection aligner
Document Type and Number:
Japanese Patent JP6238140
Kind Code:
B2
Abstract:
An illumination optical unit for a projection exposure apparatus serves for guiding illumination light toward an illumination field, in which a lithography mask can be arranged. A first facet mirror has a plurality of individual mirrors that provide illumination channels for guiding illumination light partial beams toward the illumination field. The individual mirrors each bear a multilayer reflective coating. A second facet mirror is disposed downstream of the first facet mirror in the beam path of the illumination light. A respective facet of the second facet mirror with at least one of the individual mirrors of the first facet mirror completes the illumination channel for guiding the illumination light partial beam toward the illumination field.
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Inventors:
Zenger Ingo
Application Number:
JP2014561364A
Publication Date:
November 29, 2017
Filing Date:
March 05, 2013
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B5/08; G02B5/30; G02B19/00
Domestic Patent References:
| JP2012506135A | ||||
| JP2006156857A | ||||
| JP2009290220A | ||||
| JP2009535827A |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Hiroshi Oura
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Hiroshi Oura