Title:
An illumination system and a projection aligner which have an EUV attenuation machine an illumination-light study system for EUV micro lithography, and for this kind of illumination-light study systems, and this kind of illumination-light study system
Document Type and Number:
Japanese Patent JP6041304
Kind Code:
B2
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Inventors:
Schmidt Nicholas
Hearties Joachim
Binger Ulrich
Punini Boaz
Hearties Joachim
Binger Ulrich
Punini Boaz
Application Number:
JP2012501137A
Publication Date:
December 07, 2016
Filing Date:
March 27, 2009
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
H01L21/027; G02B5/10; G02B7/182; G02B19/00
Domestic Patent References:
| JP2006128321A |
Foreign References:
| US20080212059 | ||||
| WO2007138805A1 |
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo