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Title:
ION BEAM IRRADIATION APPARATUS, SECONDARY ION MASS SPECTROMETER, ION BEAM IRRADIATION METHOD, AND SECONDARY ION MASS SPECTROMETRY METHOD
Document Type and Number:
Japanese Patent JP2017126497
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To improve uniformity of ion irradiation in an irradiation region when irradiating the irradiation region on a sample with an ion beam.SOLUTION: The ion beam irradiation apparatus for irradiating an irradiation region on a sample with an ion beam is so configured that two or more ion beams having the same cross-sectional shape perpendicular to a traveling direction of the ion beam and having different ion distribution states at the cross-section are sequentially emitted onto the irradiation region.SELECTED DRAWING: Figure 1

Inventors:
MURAYAMA YOHEI
IWASAKI KOTA
Application Number:
JP2016005345A
Publication Date:
July 20, 2017
Filing Date:
January 14, 2016
Export Citation:
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Assignee:
CANON KK
International Classes:
H01J37/04; H01J37/09; H01J37/147; H01J37/252; H01J49/06; H01J49/10; H01J49/22; H01J49/40
Attorney, Agent or Firm:
Takuma Abe
Sogo Kuroiwa