Title:
イオンビーム源
Document Type and Number:
Japanese Patent JP7255952
Kind Code:
B2
Abstract:
To provide an ion beam source that has a reduced size and saved weight and is capable of suppressing occurrence of abnormal discharge by inhibiting pressure difference from occurring in gas to be supplied to a plasma chamber.SOLUTION: An ion beam source comprises: a main body; a microwave generating unit; a plasma chamber; a gas storage unit; and a gas passage 33 that is housed in the main body and makes the gas storage unit communicate with the plasma chamber. On the gas passage 33, an isolator 32 for electrically isolating the gas storage unit from the main body is provided. The isolator 32 is configured using a carbon member 222 disposed inside an insulating tube member 331 forming the gas storage unit.SELECTED DRAWING: Figure 2
Inventors:
Naoji Yamamoto
Application Number:
JP2019114993A
Publication Date:
April 11, 2023
Filing Date:
June 20, 2019
Export Citation:
Assignee:
Naoji Yamamoto
MUSCAT Space Engineering Co., Ltd.
MUSCAT Space Engineering Co., Ltd.
International Classes:
H01J27/16
Domestic Patent References:
| JP2007324095A | ||||
| JP10275695A | ||||
| JP2011510458A | ||||
| JP6223756A | ||||
| JP2014505322A |
Attorney, Agent or Firm:
Tetsuo Shiba
Kunihiko Wakabayashi
Kunihiko Wakabayashi