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Title:
The lighting system of a micro lithography projection aligner
Document Type and Number:
Japanese Patent JP6170564
Kind Code:
B2
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JPH0332015APPARATUS FOR DETECTING AMOUNT OF PROJECTED LIGHT
Inventors:
Patra Michael
Application Number:
JP2015538303A
Publication Date:
July 26, 2017
Filing Date:
October 27, 2012
Export Citation:
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Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B19/00
Domestic Patent References:
JP2002040327A
JP2000089684A
JP2010192868A
JP2009236819A
JP2011091177A
JP2011522289A
JP2005292316A
Foreign References:
WO2011039261A1
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Naoki Kondo



 
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