Title:
The lithography system which has a negative pole composition object, an electron gun, and such an electron gun
Document Type and Number:
Japanese Patent JP6208371
Kind Code:
B2
Abstract:
The invention relates to a cathode arrangement comprising: a thermionic cathode comprising an emission portion provided with an emission surface for emitting electrons, and a reservoir for holding a material, wherein the material, when heated, releases work function lowering particles that diffuse towards the emission portion and emanate at the emission surface at a first evaporation rate; a focusing electrode comprising a focusing surface for focusing the electrons emitted from the emission surface of the cathode; and an adjustable heat source configured for keeping the focusing surface at a temperature at which accumulation of work function lowering particles on the focusing surface is prevented.
Inventors:
Dinu-Ghourtrel, Laura
Hogar Borst, Eric Petrus
Hogar Borst, Eric Petrus
Application Number:
JP2016544063A
Publication Date:
October 04, 2017
Filing Date:
December 22, 2014
Export Citation:
Assignee:
Mapper Lithography IPB.V.
International Classes:
H01J37/06; G03F7/20; H01J1/28; H01J3/18; H01J37/305; H01L21/027
Domestic Patent References:
| JP55033719A | ||||
| JP58042141A | ||||
| JP58051438A | ||||
| JP2003346671A | ||||
| JP1176641A | ||||
| JP2017501553A |
Attorney, Agent or Firm:
Kurata Masatoshi
Nobuhisa Nogawa
Naoki Kono
Tadashi Inoue
Ukai Ken
Shigeru Iino
Nobuhisa Nogawa
Naoki Kono
Tadashi Inoue
Ukai Ken
Shigeru Iino