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Title:
GAS BARRIER FILM AND PRODUCTION METHOD OF GAS BARRIER FILM
Document Type and Number:
Japanese Patent JP2017074711
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a gas barrier film having small absorption of light near a wavelength of 450 nm and excellent gas barrier property and adhesiveness between structural layers, and a production method of a gas barrier film.SOLUTION: A gas barrier film F has a base layer 2 and a gas barrier layer 3 formed in contact with the base layer on a resin substrate 1, in which the base layer 2 and the gas barrier layer 3 satisfy the following requirements. In the base layer 2, when an average composition of the layer is represented by SiOC(where v and w are stoichiometric factors), v and w satisfy 1.7≤v≤2.1 and 0.01≤w≤0.2; and the base layer has a thickness ranging from 50 to 200 nm. In the gas barrier layer 3, when an average composition of the layer is represented by SiOC(where x and y are stoichiometric factors), x and y satisfy 1.6≤x≤1.9, 0.15≤y≤0.40 and 4≤2x+2y<4.3; and the gas barrier layer has a thickness ranging from 15 to 50 nm.SELECTED DRAWING: Figure 1A

Inventors:
MORI TAKAHIRO
Application Number:
JP2015203329A
Publication Date:
April 20, 2017
Filing Date:
October 15, 2015
Export Citation:
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Assignee:
KONICA MINOLTA INC
International Classes:
B32B9/00; C23C16/42
Domestic Patent References:
JP2014046272A2014-03-17
JP2011073430A2011-04-14
Foreign References:
WO2014119754A12014-08-07
WO2015005198A12015-01-15
WO2014061597A12014-04-24
US20150247241A12015-09-03
WO2014109356A12014-07-17
WO2013077255A12013-05-30
US20140322478A12014-10-30
US20120040107A12012-02-16
Attorney, Agent or Firm:
Gwangyang International Patent Office