Title:
MANUFACTURING METHOD OF LIQUID DISCHARGE DEVICE AND LIQUID DISCHARGE DEVICE
Document Type and Number:
Japanese Patent JP2016068281
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To inhibit deterioration of the etching accuracy when a single crystal substrate made into a passage substrate is polished and then anisotropic etching is performed to a polishing surface of the substrate, and to secure good adhesiveness between the etched polishing surface and another passage member.SOLUTION: An altered layer 60 generated on a polishing surface 61 of a silicon single crystal substrate 70, which is made into a passage substrate 20, is removed by using a removal medium containing fluorine. The altered layer 60 in an area A1, in which a pressure chamber 26 is formed, of the polishing surface 61 of the silicon single crystal substrate 70 is removed. However, the altered layer 60 in an area A2 joined to a nozzle plate 21 is left.SELECTED DRAWING: Figure 7
Inventors:
HIRAI KEITA
Application Number:
JP2014197244A
Publication Date:
May 09, 2016
Filing Date:
September 26, 2014
Export Citation:
Assignee:
BROTHER IND LTD
International Classes:
B41J2/16; B41J2/14
Domestic Patent References:
| JP2004082722A | 2004-03-18 | |||
| JP2007050673A | 2007-03-01 | |||
| JP2006281603A | 2006-10-19 | |||
| JP2009006641A | 2009-01-15 | |||
| JPH01233734A | 1989-09-19 | |||
| JPH11191543A | 1999-07-13 |
Foreign References:
| US5350616A | 1994-09-27 |
Attorney, Agent or Firm:
Kaji/Suhara Patent Office