Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
A manufacturing method of the mold for cylindrical nanoimprints, and a manufacturing method of the reproduction mold for nanoimprints
Document Type and Number:
Japanese Patent JP6265127
Kind Code:
B2
Abstract:
Provided is a method for producing a cylindrical nanoimprinting mold such that the outer peripheral surface of a cylindrical aluminum substrate is uniformly polished, and it is possible to effectively take advantage of the outer peripheral surface. The method forms an oxide film at the outer peripheral surface (14) of an aluminum substrate (10) after polishing the entire outer peripheral surface (14) of the cylindrical aluminum substrate (10) by means of a polishing body (26), wherein the polishing body (26) is moved in the axial direction to polish in a manner such that at least a portion of the polishing body (26) is protruding beyond the first end (10a) side and second end (10b) side of the aluminum substrate (10), and the portion of the polishing body (26) protruding beyond the aluminum substrate (10) is disposed on and supported by a cylindrical first support member (18); and second support member (20).

Inventors:
Shinya
Okawa Makoto
Kazuya Takanashi
Katsumi Hara
Application Number:
JP2014541466A
Publication Date:
January 24, 2018
Filing Date:
August 11, 2014
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
Mitsubishi Chemical Corporation
International Classes:
B29C59/04; B29C33/38; C25D11/04; C25D11/16; C25D11/18; C25D11/24
Domestic Patent References:
JP2012037670A
JP2007030146A
Foreign References:
WO2009145049A1
WO2009107294A1
WO2011030850A1
WO2009054513A1
WO2008001847A1
Attorney, Agent or Firm:
Masatake Shiga
Tadashi Takahashi
Suzuki Mitsuyoshi