Title:
A manufacturing method of the mold for cylindrical nanoimprints, and a manufacturing method of the reproduction mold for nanoimprints
Document Type and Number:
Japanese Patent JP6265127
Kind Code:
B2
Abstract:
Provided is a method for producing a cylindrical nanoimprinting mold such that the outer peripheral surface of a cylindrical aluminum substrate is uniformly polished, and it is possible to effectively take advantage of the outer peripheral surface. The method forms an oxide film at the outer peripheral surface (14) of an aluminum substrate (10) after polishing the entire outer peripheral surface (14) of the cylindrical aluminum substrate (10) by means of a polishing body (26), wherein the polishing body (26) is moved in the axial direction to polish in a manner such that at least a portion of the polishing body (26) is protruding beyond the first end (10a) side and second end (10b) side of the aluminum substrate (10), and the portion of the polishing body (26) protruding beyond the aluminum substrate (10) is disposed on and supported by a cylindrical first support member (18); and second support member (20).
Inventors:
Shinya
Okawa Makoto
Kazuya Takanashi
Katsumi Hara
Okawa Makoto
Kazuya Takanashi
Katsumi Hara
Application Number:
JP2014541466A
Publication Date:
January 24, 2018
Filing Date:
August 11, 2014
Export Citation:
Assignee:
Mitsubishi Chemical Corporation
International Classes:
B29C59/04; B29C33/38; C25D11/04; C25D11/16; C25D11/18; C25D11/24
Domestic Patent References:
JP2012037670A | ||||
JP2007030146A |
Foreign References:
WO2009145049A1 | ||||
WO2009107294A1 | ||||
WO2011030850A1 | ||||
WO2009054513A1 | ||||
WO2008001847A1 |
Attorney, Agent or Firm:
Masatake Shiga
Tadashi Takahashi
Suzuki Mitsuyoshi
Tadashi Takahashi
Suzuki Mitsuyoshi
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