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Title:
The manufacturing method, novolac type phenol resin, and the photoresist constituent of novolac type phenol resin
Document Type and Number:
Japanese Patent JP6070020
Kind Code:
B2
Inventors:
Sadaaki Kuroiwa
Takahisa Furumoto
Application Number:
JP2012216429A
Publication Date:
February 01, 2017
Filing Date:
September 28, 2012
Export Citation:
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Assignee:
Meiwa Kasei Co., Ltd.
International Classes:
C08G8/12; G03F7/023
Domestic Patent References:
JP61042530A
JP9302058A
JP2008138128A
JP2008088197A
JP8211601A
JP2084414A
Foreign References:
WO2011013571A1
Attorney, Agent or Firm:
Masaru Itami
Kazuya Chikatsu



 
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