Title:
A manufacturing method of pigment dispersion liquid and the photosensitive resin composition using it
Document Type and Number:
Japanese Patent JP6210691
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a pigment dispersion liquid having good dispersibility of a pigment after lapse of time and capable of giving a photosensitive resin composition even after lapse of time, the composition permitting formation of a micropattern with high adhesiveness at a low exposure dose, and to provide a production method of a photosensitive resin composition using the pigment dispersion liquid.SOLUTION: The pigment dispersion liquid comprises: a pigment; a solvent; and a compound expressed by formula (1) below. In the formula, Rand Reach independently represent a hydrogen atom or an organic group, however, at least one of them represents an organic group, and Rand Rmay be bonded to form a cyclic structure and may include a bond of hetero atoms; Rrepresents a single bond or an organic group; Rto Reach independently represent a hydrogen atom, an organic group or the like, however, Rand Rare inhibited from being a hydroxyl group; and Rrepresents a hydrogen atom or an organic group.
Inventors:
Kuroko Mayumi
Shioda Dai
Isao Tateno
Kunihiro Noda
Shioda Dai
Isao Tateno
Kunihiro Noda
Application Number:
JP2013023600A
Publication Date:
October 11, 2017
Filing Date:
February 08, 2013
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
C09D17/00; C07C235/34; C07D233/60; C09B67/46
Foreign References:
| WO2012176694A1 |
Attorney, Agent or Firm:
Masayuki Masabayashi