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Title:
A manufacturing method of a porous high polymer film, and a porous high polymer film
Document Type and Number:
Japanese Patent JP6044895
Kind Code:
B2
Abstract:
Disclosed is a method for producing a porous polymer film. This method includes the steps of: (I) irradiating a polymer film with an ion beam of accelerated ions so as to form a polymer film that has collided with the ions in the beam; and (II) chemically etching the polymer film formed in the step (I) so as to form openings and/or through holes corresponding to tracks of the colliding ions left in the polymer film. In the step (I), the polymer film is placed in an atmosphere with a pressure of 100 Pa or more, and the polymer film placed in the atmosphere is irradiated with the ion beam that has passed through a beam line maintained at a lower pressure than the pressure of the atmosphere and through a pressure barrier sheet disposed at an end of the beam line to separate the beam line from the atmosphere.

Inventors:
Ryo Furuyama
Junichi Moriyama
Yozo Nagai
Yusuke Yosuke
Ikuo Ishibori
Takahiro Yuyama
Tomohisa Ishizaka
Susumu Okumura
Yasunari Maekawa
Hiroshi Koshikawa
Tetsuya Yamaki
Asano Masaharu
Application Number:
JP2013067306A
Publication Date:
December 14, 2016
Filing Date:
March 27, 2013
Export Citation:
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Assignee:
NITTO DENKO CORPORATION
Japan Atomic Energy Agency
International Classes:
C08J9/36; C08J9/00; G21K5/00; G21K5/04; G21K5/10
Domestic Patent References:
JP46005680B1
JP1500577A
JP2002341097A
JP2008068275A
JP2009142871A
JP5051479A
JP2005305444A
JP2011184626A
JP2004058415A
JP63154750A
Foreign References:
US4956219
US3612871
US4832997
Attorney, Agent or Firm:
Koichi Kamata



 
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