A manufacturing method of salt, a resist composition, and a resist pattern

Title:

A manufacturing method of salt, a resist composition, and a resist pattern

Document Type and Number:

Japanese Patent JP5970926

Kind Code:

B2

Abstract:

A salt represented by formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 0 or 1, Ll represents a single bond or a C1-C10 alkanediyl group in which a methylene group may be replaced by an oxygen atom or carbonyl group, provided that Ll is not a single bond when n is 0, ring W represents a C3-C36 aliphatic ring in which a methylene group may be replaced by an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group and in which a hydrogen atom may be replaced by a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, Rl represents a hydroxyl group or a hydroxyl group protected by a protecting group, and Z+ represents an organic cation.

Inventors:

Yukako Adachi
Koji Ichikawa

Application Number:

JP2012086143A

Publication Date:

August 17, 2016

Filing Date:

April 05, 2012

Export Citation:

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