Title:
A manufacturing method of salt, a resist composition, and a resist pattern
Document Type and Number:
Japanese Patent JP5972748
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a resist composition satisfying the shape of a resist pattern.SOLUTION: A salt is represented by formula (I), wherein Qand Qare each independently a fluorine atom or a perfluoroalkyl group; Land Lare each independently a divalent saturated hydrocarbon group or the like; the ring Wis an aromatic ring; the ring Wis a sultone ring; Ris a hydroxy group or an alkyl group; Ris an alklyl group, an alkoxy group or an alkoxycarbonyl group; s and t are an integer of 0 to 2; and Zis an organic counter ion.
Inventors:
Koji Ichikawa
Mitsuyoshi Ochiai
Yuko Yamashita
Mitsuyoshi Ochiai
Yuko Yamashita
Application Number:
JP2012229815A
Publication Date:
August 17, 2016
Filing Date:
October 17, 2012
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07D327/04; C07C381/12; C09K3/00; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| JP2010106236A | ||||
| JP2011081044A |
Foreign References:
| WO2011018467A1 |
Attorney, Agent or Firm:
Fukami patent office
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