Title:
A manufacturing method of salt, a resist composition, and a resist pattern
Document Type and Number:
Japanese Patent JP6137365
Kind Code:
B2
Abstract:
The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 and L2 independently each represent a C1-C17 divalent saturated hydrocarbon group in which one or more -CH2- can be replaced by -O- or -CO-, ring W1 and ring W2 independently each represent a C3-C36 aliphatic ring, R2 is independently in each occurrence a C1-C6 alkyl group, R4 is independently in each occurrence a C1-C6 alkyl group, R3 represents a C1-C12 hydrocarbon group, t represents an integer of 0 to 2, u represents an integer of 0 to 2, and Z+ represents an organic counter ion.
Inventors:
Isao Yoshida
Koji Ichikawa
Koji Ichikawa
Application Number:
JP2016044136A
Publication Date:
May 31, 2017
Filing Date:
March 08, 2016
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C07C309/17; C07C381/12; C09K3/00; G03F7/004; G03F7/039; H01L21/027
Domestic Patent References:
| JP2011046694A | ||||
| JP2003149800A | ||||
| JP2011037839A | ||||
| JP2009040761A |
Foreign References:
| US20110117495 |
Attorney, Agent or Firm:
Toru Nakayama
Toru Sakamoto
Toru Sakamoto
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