Title:
A manufacturing method of separation microstructure and separation nano structure using soft lithography or imprint lithography
Document Type and Number:
Japanese Patent JP6232320
Kind Code:
B2
Abstract:
The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography techniques.
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Inventors:
Joseph M. de Simone
Jason P. Rolland
Ansley E. Exnel
Edwald T. Samurski
Ared jude samurski
Benjamin W. Mynor
Lalken E. Euliss
Ginger M. Denison
Jason P. Rolland
Ansley E. Exnel
Edwald T. Samurski
Ared jude samurski
Benjamin W. Mynor
Lalken E. Euliss
Ginger M. Denison
Application Number:
JP2014054051A
Publication Date:
November 15, 2017
Filing Date:
March 17, 2014
Export Citation:
Assignee:
THE UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL
International Classes:
B01J2/00; A61K9/00; A61K9/51; B01J19/00; B81C99/00; G03F7/00; H01L21/02; H01L21/027; H01L51/00; H01L51/40
Domestic Patent References:
| JP3517575B1 | ||||
| JP5725911A | ||||
| JP1614288Y1 | ||||
| JP4217591B1 | ||||
| JP2007526820A |
Other References:
国武豊喜ら,ナノコピー法による3次元ナノ構造の作成,未来材料,2003年,第3巻,第8号,20-27頁
Attorney, Agent or Firm:
Toru Ishikawa
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