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Title:
A manufacturing method of separation microstructure and separation nano structure using soft lithography or imprint lithography
Document Type and Number:
Japanese Patent JP6232320
Kind Code:
B2
Abstract:
The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography techniques.

Inventors:
Joseph M. de Simone
Jason P. Rolland
Ansley E. Exnel
Edwald T. Samurski
Ared jude samurski
Benjamin W. Mynor
Lalken E. Euliss
Ginger M. Denison
Application Number:
JP2014054051A
Publication Date:
November 15, 2017
Filing Date:
March 17, 2014
Export Citation:
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Assignee:
THE UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL
International Classes:
B01J2/00; A61K9/00; A61K9/51; B01J19/00; B81C99/00; G03F7/00; H01L21/02; H01L21/027; H01L51/00; H01L51/40
Domestic Patent References:
JP3517575B1
JP5725911A
JP1614288Y1
JP4217591B1
JP2007526820A
Other References:
国武豊喜ら,ナノコピー法による3次元ナノ構造の作成,未来材料,2003年,第3巻,第8号,20-27頁
Attorney, Agent or Firm:
Toru Ishikawa