Title:
A manufacturing method of the sputtering target for forming a transparent electrode film
Document Type and Number:
Japanese Patent JP5976855
Kind Code:
B2
Inventors:
Masataka Yahagi
Yoshiro Yangi
Atsushi Nakamura
Yoshiro Yangi
Atsushi Nakamura
Application Number:
JP2015011555A
Publication Date:
August 24, 2016
Filing Date:
January 23, 2015
Export Citation:
Assignee:
JX Nippon Mining & Metals Co., Ltd.
International Classes:
C23C14/34; C04B35/00; C23C14/08
Domestic Patent References:
| JP2309511A |
Other References:
Морозова Л.В. et.al,ЭЛЕКТРИЧЕСКИЕ СВОЙСТВА ТВЕРДЫХ РАСТВОРОВ В СИСТЕМЕ,ЖУРНАЛ ФИЗИЧЕСКОЙ ХИМИИ,ロシア,1986年,Vol.60 No.6,P.1430-1434
СОЛОВЬЕВА А. Е. et.al,ТВЕРДЫЕ РАСТВОРЫ В СИСТЕМЕ In2O3 - ZrO2,НЕОРГАНИЧЕСКИЕ МАТЕРИАЛЫ,ロシア,1982年,Vol.18 No.4,p.640-642
Y.Sawada et.al,Colors and resistivities of sintered bodies of indium oxide doped with various tetravalent ions,Transactions of the Materials Research of Society of Japan,日本,2008年,33[4],1359-1362
СОЛОВЬЕВА А. Е. et.al,ТВЕРДЫЕ РАСТВОРЫ В СИСТЕМЕ In2O3 - ZrO2,НЕОРГАНИЧЕСКИЕ МАТЕРИАЛЫ,ロシア,1982年,Vol.18 No.4,p.640-642
Y.Sawada et.al,Colors and resistivities of sintered bodies of indium oxide doped with various tetravalent ions,Transactions of the Materials Research of Society of Japan,日本,2008年,33[4],1359-1362
Attorney, Agent or Firm:
Ikki Kogoshi
Isamu Ogoshi
Isamu Ogoshi
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