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Title:
The manufacturing method of a substrate, the manufacturing method of a substrate with a multilayer film, a manufacturing method of a mask blank, a manufacturing method of the mask for transfer, and a substrate manufacture device
Document Type and Number:
Japanese Patent JP6133189
Kind Code:
B2
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JPS56104334PHOTOMASK FOR CONTACT EXPOSURE
JP6161913The manufacturing method of the substrate for mask blanks, a manufacturing method of a substrate with a multilayer reflection film, a manufacturing method of a mask blank, and a manufacturing method of the mask for transfer
JP2008116571METHOD OF MANUFACTURING SUBSTRATE FOR MASK BLANK AND METHOD OF MANUFACTURING MASK BLANK, AND METHOD OF MANUFACTURING TRANSFER MASK
Inventors:
Kazuhiro Hamamoto
Toshihiko Orihara
Lol Ki Tsutomu
Application Number:
JP2013211713A
Publication Date:
May 24, 2017
Filing Date:
October 09, 2013
Export Citation:
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Assignee:
HOYA CORPORATION
International Classes:
G03F1/60; C03C15/00; G03F1/24
Other References:
山内 和人 他,"触媒表面基準エッチングによる単結晶SiC,GaN,ZnO表面の平滑化",表面科学,2012年,Vol.33,No.6,pp.334-338
山口 航 他,"触媒表面基準エッチング法による機能性材料の平坦化加工",2013年度精密工学会秋季大会学術講演論文集,2013年 9月12日,L67, pp.679-680
山内 和人 他,"ウエットエッチングによる原子スケール平坦化",応用物理,2013年 5月 9日,Vol.82, No.5,pp.403-405
Attorney, Agent or Firm:
Hiroshi Oshino
Takafumi Oshima



 
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