Title:
紫外光発生用ターゲット、電子線励起紫外光源、及び紫外光発生用ターゲットの製造方法
Document Type and Number:
Japanese Patent JP5580777
Kind Code:
B2
Abstract:
An ultraviolet light generating target 20 includes a substrate 21 made of sapphire, quartz or rock crystal; and a Pr:LuAG polycrystalline film 22, provided on the substrate 21, that generates ultraviolet light upon receiving an electron beam. By using a Pr:LuAG polycrystal as the target, the ultraviolet light generating efficiency can be increased more remarkably than when a Pr:LuAG single crystal film is used.
Inventors:
Yoshinori Honda
Fumitsugu Fukuyo
Takashi Suzuki
Norio Ichikawa
Takeaki Hattori
Koji Kawai
楚 樹成
Fumitsugu Fukuyo
Takashi Suzuki
Norio Ichikawa
Takeaki Hattori
Koji Kawai
楚 樹成
Application Number:
JP2011097260A
Publication Date:
August 27, 2014
Filing Date:
April 25, 2011
Export Citation:
Assignee:
Hamamatsu Photonics, Inc.
International Classes:
C09K11/80; C30B29/28; H01J63/06
Attorney, Agent or Firm:
Yoshiki Hasegawa
Yoshiki Kuroki
Ishida 悟
Yoshiki Kuroki
Ishida 悟
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