Title:
マスクデータ補正装置、転写用マスクの製造方法、および、パターン構造を有する装置の製造方法
Document Type and Number:
Japanese Patent JP4671473
Kind Code:
B2
Abstract:
A mask data correction apparatus that can increase efficiency of processing while maintaining high accuracy by effectively using the hierarchical structure of a layout data: A Fourier transformation part performs Fourier transformation of base elements defined by the layout data to obtain Fourier images of the base elements. A synthesizing part superimposes, based on the hierarchical structure, the Fourier images of the base elements in Fourier space, to obtain a Fourier image of the entire graphic. A spatial filter part subjects the Fourier image of the entire graphic to spatial filter processing that corresponds to distortion expected in a manufacturing process. An inverse Fourier transformation part performs inverse Fourier transformation of the Fourier image after spatial filter processing, to obtain the inverse Fourier image reflecting the distortion. The graphic defined by the layout data is compared with the graphic of which inverse Fourier image has been transformed, and is corrected in such a direction as to suppress distortion, and then is outputted as a mask data.
Inventors:
Kamon Kazuya
Application Number:
JP2000214002A
Publication Date:
April 20, 2011
Filing Date:
July 14, 2000
Export Citation:
Assignee:
Renesas Electronics Corporation
International Classes:
G03F1/68; G03F1/70; G03F7/20; G06F17/50; H01J37/302; H01L21/027; H01L21/66
Domestic Patent References:
| JP7128138A | ||||
| JP6204112A | ||||
| JP8297692A | ||||
| JP5107726A | ||||
| JP10282635A | ||||
| JP9167731A | ||||
| JP10335224A | ||||
| JP11110585A |
Foreign References:
| WO2001054046A1 | ||||
| US6171731 |
Attorney, Agent or Firm:
Yoshitake Hidetoshi
Takahiro Arita
Takahiro Arita