Title:
パターニングされたマスク被膜と支持体からなる積層構造の薄膜パターン形成用マスク及びその製造方法
Document Type and Number:
Japanese Patent JP4104964
Kind Code:
B2
Abstract:
To provide a mask for forming a thin film pattern of a lamination structure to solve a problem of accuracy degradation when a metal mask of high accuracy is used, and a method for manufacturing the same.
In the mask for forming the thin film pattern of a lamination structure, a mask film having an aperture pattern and a supporting body of the pattern shape corresponding to a mask film pattern are laminated.
COPYRIGHT: (C)2004,JPO&NCIPI
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Inventors:
Kenji Ohara
Application Number:
JP2002356279A
Publication Date:
June 18, 2008
Filing Date:
December 09, 2002
Export Citation:
Assignee:
Nippon Filcon Co., Ltd.
International Classes:
C23C14/04; H01L51/50; H05B33/10; H05B33/14
Domestic Patent References:
| JP10330911A | ||||
| JP64045160U | ||||
| JP61151533A | ||||
| JP62164865A | ||||
| JP7300664A |
Attorney, Agent or Firm:
Kazuo