マスク - Rohm and Haas Electronic Materials, L.L.C.

Title:

マスク

Document Type and Number:

Japanese Patent JP4875834

Kind Code:

B2

Abstract:

A mask is described for forming an image on a substrate. The mask may be selectively applied to a radiant energy sensitive material on the substrate. Actinic radiation applied to the composite chemically changes portions of the radiant energy sensitive material not covered by the mask. The mask and portions of the radiant energy sensitive material are removed using a suitable aqueous base developer. The mask is composed of aqueous base soluble or dispersible polymers and light-blocking agents.

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Inventors:

Edward anzules
Robert caber
Thomas Sea Sutter

Application Number:

JP2004097220A

Publication Date:

February 15, 2012

Filing Date:

March 29, 2004

Export Citation:

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Assignee:

Rohm and Haas Electronic Materials, L.L.C.

International Classes:

B41J2/01; B41M5/00; C08L101/00; C08L101/14; C09D11/00; C09D11/10; G03C1/492; G03F1/00

Domestic Patent References:

JP2001527598A
JP2000327371A
JP2002333712A
JP11256047A
JP11246760A
JP2002229201A

Attorney, Agent or Firm:

Patent Business Corporation Sender International Patent Office
Koji Hashimoto

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