Title:
保護膜形成用材料、およびこれを用いたホトレジストパターン形成方法
Document Type and Number:
Japanese Patent JP4611137
Kind Code:
B2
Abstract:
This invention provides a material for protective film formation, comprising at least an alkali soluble polymer comprising at least one of constitutional units represented by general formulae (I) and (II) and an alcoholic solvent. The material for protective film formation can simultaneously prevent a deterioration in a resist film during liquid immersion exposure and a deterioration in a liquid for liquid immersion exposure used and, at the same time, can form a resist pattern with a good shape without the need to increase the number of treatment steps.
Inventors:
Keita Ishizuka
Kotaro Endo
Masaaki Yoshida
Kotaro Endo
Masaaki Yoshida
Application Number:
JP2005203150A
Publication Date:
January 12, 2011
Filing Date:
July 12, 2005
Export Citation:
Assignee:
Tokyo Ohka Kogyo Co., Ltd.
International Classes:
G03F7/11; C08F20/24; C08F32/04; H01L21/027
Domestic Patent References:
| JP2005157259A | ||||
| JP2006133716A | ||||
| JP2006053300A |
Other References:
Yamashita, T.; Ishikawa, T.; Yoshida, T.; Hayamai, T.; Araki, T.; Aoyama, H.; Hagiwara, T.; Itani, T,Synthesis of Fluorinated Materials for 193-nm Immersion Lithography and 157-nm Lithography,Journal of Photopolymer Science and Technology,2005年 6月28日,631-639
Attorney, Agent or Firm:
Masayuki Masabayashi