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Title:
真空アーク炉における電極ギャップの閉ループ制御のための方法および装置
Document Type and Number:
Japanese Patent JP5824521
Kind Code:
B2
Abstract:
A method and a device for closed-loop control of an electrode gap in a vacuum arc furnace subjects an electrode gap of a melting electrode from the surface of a melt material to closed-loop control as a function of a droplet short-circuit rate. For this purpose, a histogram of detected droplet short-circuits is created on the basis of at least one droplet short-circuit criterion. The histogram is subdivided into sub-areas, a characteristic sub-area of the histogram is selected for closed-loop control purposes. The electrode gap is subjected to closed-loop control on the basis of the droplet short-circuits which can be associated with the selected sub-area.

Inventors:
Ralph
Holz, holz
Hoffman, Frank-Berner
Application Number:
JP2013534244A
Publication Date:
November 25, 2015
Filing Date:
October 06, 2011
Export Citation:
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Assignee:
ALD Vacuum Technologies GmbH
International Classes:
H05B7/148; F27D11/08
Domestic Patent References:
JP8069877A
JP63502785A
JP2054892A
JP7022174A
JP2683372B2
JP6325867A
JP5230559A
JP2014500938A
Foreign References:
US4578795
US4881239
US5708677
US6115404
DE3544005A1
Attorney, Agent or Firm:
Fukami patent office