Title:
A method and a device for the deposition using atmospheric pressure plasma
Document Type and Number:
Japanese Patent JP6085305
Kind Code:
B2
Abstract:
An apparatus may comprise a plasma deposition unit, a movement system, and a mesh system. The plasma deposition unit may be configured to generate a plasma. The movement system may be configured to move a substrate under the plasma deposition unit. The mesh system may be located between the plasma deposition unit and the substrate in which a mesh may comprise a number of materials for deposition onto the substrate and in which the plasma passing through the mesh may cause a portion of the number of materials from the mesh to be deposited onto the substrate.
Inventors:
Marvie A. Matos
Liam S. Pingley
Liam S. Pingley
Application Number:
JP2014538808A
Publication Date:
February 22, 2017
Filing Date:
October 01, 2012
Export Citation:
Assignee:
The Boeing Company
International Classes:
C23C14/22; H05H1/24; H05H1/46; H05H1/48
Domestic Patent References:
| JP55141721A | ||||
| JP2005273016A |
Foreign References:
| US3654110 | ||||
| GB1224284A |
Attorney, Agent or Firm:
Yasuhiko Murayama
Masatake Shiga
Takashi Watanabe
Shinya Mitsuhiro
Masatake Shiga
Takashi Watanabe
Shinya Mitsuhiro