Title:
光レジスト組成物、光レジスト組成物を含むコーティングされた基材、及び電子装置を形成する方法
Document Type and Number:
Japanese Patent JP6553585
Kind Code:
B2
Abstract:
A photoresist composition, including an acid-sensitive polymer and photoacid generator compound having Formula (I):wherein, EWG, Y, R, and M+ are the same as described in the specification.
Inventors:
Imad Acad
William Williams Third
James F Cameron
William Williams Third
James F Cameron
Application Number:
JP2016244687A
Publication Date:
July 31, 2019
Filing Date:
December 16, 2016
Export Citation:
Assignee:
Rohm and Haas Electronic Materials LLC
International Classes:
G03F7/004; C07C25/18; C07C255/24; C07C255/31; C07C255/34; C07C381/12; C08F220/18; G03F7/039; G03F7/20
Domestic Patent References:
| JP2011510109A | ||||
| JP2017125007A | ||||
| JP2012032671A | ||||
| JP2011053364A | ||||
| JP2011048111A | ||||
| JP2008026725A | ||||
| JP2011037825A | ||||
| JP2013047783A |
Attorney, Agent or Firm:
Patent Business Corporation Sender International Patent Office